[1]王翠娟,范素华*,张丰庆,等.BiFeO3薄膜的制备及掺杂改性研究进展[J].山东建筑大学学报,2014,(01):64-70.
 Wang Cuijuan,Fan Suhua*,Zhang Fengqing,et al.Progress in the preparation and doping modification of BiFeO3 thin films[J].Journal of Shandong jianzhu university,2014,(01):64-70.
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BiFeO3薄膜的制备及掺杂改性研究进展()
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《山东建筑大学学报》[ISSN:1673-7644/CN:37-1449/TU]

卷:
期数:
2014年01期
页码:
64-70
栏目:
综合述评
出版日期:
2014-02-15

文章信息/Info

Title:
Progress in the preparation and doping modification of BiFeO3 thin films
作者:
王翠娟1范素华12*张丰庆1董蓬超1郭晓东1解肖斌1
(1.山东建筑大学 材料科学与工程学院,山东 济南 250101;2.山东女子学院,山东 济南 250002)
Author(s):
Wang Cuijuan1Fan Suhua12*Zhang Fengqing1et al.
School of Material Science and Engineering, Shandong Jianzhu University,Jinan 250101,China; 2. Shandong Women’s University Jinan 250002,China
关键词:
BiFeO3薄膜进展制备掺杂改性
Keywords:
BiFeO3 thin filmprogresspreparationdoping modification
分类号:
TM22+1
文献标志码:
A
摘要:
BiFeO3薄膜是当前多铁材料研究的热点之一。作为一种无铅多铁材料,BiFeO3薄膜优异的铁电和磁学性能使它在信息存储器、传感器和自旋电子器件等众多功能材料领域都有广阔的应用前景。但目前还存在漏电流较大及老化等一系列问题,使其与未来器件应用的要求还有一定差距。目前改善 BiFeO3薄膜多铁性能的方法主要是通过改进制备工艺及掺杂改性。文章综述了BiFeO3薄膜近年的研究进展,介绍了其晶体结构及性能、制备工艺、掺杂改性,并展望了 BiFeO3薄膜未来可能的研究方向和发展趋势。
Abstract:
BiFeO3  thin film is one of the hotspots in the research of multiferroic materials.  As a lead-free multiferroic material,excellent ferroelectric and magnetic properties of BiFeO3  thin film enable its
potential application in many areas of functional materials such as information storage,sensors and spintronic devices.  However, there are still problems such as leakage current and aging that hinder its application in  ferroelectric  devices.  At  present,the  main  methods  to  improve  the  multiferroic properties of BiFeO3  thin film are the improvement of preparation process and doping modification.This paper summarizes the research advances in BiFeO3  thin films,introduces its crystal structure and properties,preparation method and doping modification,and looks forward to the possible research direction and development trend of BiFeO3  thin films.
更新日期/Last Update: 2014-03-25